The advanced technologies have witnessed a sharply growing demand for developing and using powerful analytical methods with respect to high sensitivities, accuracy and analysis time for characterizing of trace and ultra-trace level of impurities on different specific properties of materials. Herein, we introduce electrothermal vaporization (ETV) coupled with inductively coupled plasma optical emission spectrometry (ICP-OES) as an exceptionally sensitive solid sampling technique for purity verifications of high-performance materials based on carbon, silicon, and silicon carbide.
These materials have wide technologically innovative applications and technical importance due to its outstanding properties useful for lithium-ion batteries, fuel cells, opto- and micro-electronics, water purification, fiber optics, spintronics, refractories, electric vehicles, etc [1-2]. Depending on materials purity, the future scope of a new market can also be identified. Thus, the trace and ultra-trace element contents and other chemical parameters are of eminent importance.