Total Reflection X-ray Fluorescence (TXRF) is a non-destructive elemental survey technique utilized for quantifying trace level surface contamination of semiconductor wafers and thin films. TXRF is a form of energy dispersive XRF that uses a very shallow incident angle (typically less than 0.05°) to probe only the top ~50Å of a smooth reflective surface.
The technique utilizes multiple X-ray excitation sources of different energies to quantify a wide range of elements stretching from Na to U. With a 1 cm analytical spot, one of the greatest strengths of TXRF is the ability map the spatial distribution of contaminants across the full surface of a wafer.
This webinar aims to give an overview of the fundamentals of TXRF as it pertains to the semiconductor world and demonstrates how we utilize the technique to characterize substrates and thin films at EAG.
In this webinar we will cover:
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