A preview of his presentation:
Well, do you remember when a factor of two was good enough? Probably not. You would have to have been around SIMS in the early 1970s. This presentation will give many references back to the early days when a local thermal equilibrium (LTE) model was used to obtain the first results that were accurate to within a factor of two…but only 60% of the time. And it only worked for bulk silicate matrixes! People were not even using SIMS on semiconductors in those days. Several early references showing profiles of ion implants in Si will be referenced, but it was not until 1980 that the first paper was published that explicitly showed how to use ion implants as SIMS standards. People were using ion implants as standards before 1980, but only in limited cases, and with no formal published equations specifying how to use them.