Plasma Focused Ion Beam (P-FIB) is a special type of DualBeam instrument that combines a Scanning Electron Microscope (SEM) with a plasma-based Focused Ion Beam (FIB). While traditional DualBeam FIB utilizes Ga, P-FIB instead uses a gas plasma source to generate the high energy ions used for physical sputtering of a sample. P-FIB is a failure analysis and materials characterization game changer, enabling larger, mechanical free, targeted SEM cross-sectioning and TEM sample preparation of a wide variety of materials. This new source type enables significantly higher beam currents for removal of much larger volumes of material in reasonable amounts of time while retaining nm spatial resolution imaging capability and quality. Being Ga free, P-FIB also provides a way to process optoelectronic materials and devices less invasively, reducing preparation artifacts, significantly improving localized electrical and optical characterization techniques such as Electron Beam Induced Current (SEM-EBIC/STEM-EBIC) or Cathodoluminescence (SEM-CL).
In this webinar we will introduce the instrumentation, its capabilities, and provide example results on a variety of sample types, demonstrating the utility of the technique, and how PFIB could be the best solution for your challenging characterization needs.
In this webinar we will cover:
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